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样例:分子模板法制备有序介孔氧化硅薄膜

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     有序介孔薄膜孔道均一有序,孔径在2～30nm范围可连续调节,在催化、传感、医药、环境净化、光学和微电子制造等方面具有广阔的应用前景。本文以正硅酸乙酯(TEOS)为硅源,十六烷基三甲基溴化铵(CTAB)为模板剂,通过溶胶-凝胶、旋转涂胶、煅烧萃取、超临界干燥以及疏水处理等工艺, 依据溶剂挥发诱导自组装原理,制备了有序介孔氧化硅薄膜;采用XRD、TEM、FT-IR、TG-DTA以及椭偏仪等对薄膜的微观结构和性能进行了表征。主要结果如下: (1) 通过考察EtOH/TEOS、HCl/TEOS以及CTAB/TEOS等参数变化对有序介孔氧化硅薄膜结构和性能的影响,确定的较佳原料配方为(摩尔比): 1TEOS∶10H_2O∶10EtOH∶1.8×10~(-3)HCl∶0.2CTAB

错误译文

    The ordered mesoporous thin films may be found great potential applications in catalysis, sensing, medicine, purifying environment, photonics and microelectronics, as they have uniform pores arraying orderly and the size of the pores can be tuned in the range of 2~30 nm.The ordered mesoporous thin films were synthesized by the evaporation-induced self-assembly using cetyltrimethylammonium bromide (CTAB) as template and tetraethyl--orthosilicate (TEOS) as silica source. During the synthesis, these processes were utilized including sol-gel, spin-coating, calcining, solvent-extraction and dehydroxylating of the films. The microstructure and properties of the thin films were characterized using XRD, TEM, FT-IR, TG-DTA and Ellisometry. The results were as follows:(1) The influence on the mesostructure and properties of the thin films were studied by varying the ratio of EtOH/TEOS, HCl/TEOS and CTAB/TEOS. And a rational proportion(mol ratio ) of the raw materials is:1TEOS : 10H_2O : 10EtOH : 1.8×10~(-3)HCl : 0.2CTAB

修改后译文

     The ordered mesoporous thin films may have great potential applications in catalysis, sensing, medicine, environment purification, photonics and microelectronics, as they have uniform pores arraying orderly with the size of the pores tunable in the range of 2~30 nm. The ordered mesoporous thin silica films were synthesized according to the evaporation-induced self-assembly method through the processes of sol-gel, spin-coating, calcination, solvent-extraction, super-critical drying and hydrophobization of the films, with cetyltrimethylammonium bromide (CTAB) as template and tetraethyl--orthosilicate (TEOS) as silica source. The microstructure and properties of the thin films were characterized using XRD, TEM, FT-IR, TG-DTA and Ellisometry. The results were as follows: (1) The influence on the mesostructure and properties of the thin films were studied by varying the ratio of EtOH/TEOS, HCl/TEOS and CTAB/TEOS. And a rational proportion(mol ratio ) of the raw materials is:1TEOS : 10H_2O : 10EtOH : 1.8×10~(-3)HCl : 0.2CTAB


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