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翻译样例: 纵向磁场中溅射机理研究
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将传统磁控溅射设备阴极内的磁场屏蔽,而在基片下放置一块永磁铁,即在溅射空间加一纵向磁场;利用该纵向磁场进行溅射。利用这种配置,我们可以研究纵向磁场对溅射粒子的运动影响。我们发现,在这种实验装置下,所沉积的薄膜的表面宏观形貌呈现规则的几何图形特征:膜的中央有一圆斑,而在圆斑的外围有规则分布的环。但这一中央圆斑的膜厚随着靶材元素和基片在磁铁上方的高度而变化。对这一实验现象的产生机理,我们发现从量子力学角度、宏观量子效应角度,以及直接考虑由于梯度磁场使粒子在横向产生偏离都不能彻底解释我们的实验现象。最终我们认为,在我们的溅射空间中,存在着大量溅射靶材的离子,溅射靶材的离子在溅射过程中会受到洛仑兹力作用、梯度磁场力的作用,以及他们的相互作用力;导致了斑环的产生。从而对纵向磁场中的溅射机理进行了探讨。

错误译文

Shielding the magnetic field in the cathode of the traditional magnetron sputtering device and introducing a magnet below the substrate, let the magnetic field under the substrate take action during sputtering. In this way, the effect of the longitudinal magnetic field on the movements of the plasma during deposition can be investigated. The appearances of the films deposited by this means are: in the center of each film, there’s a spot, and the spot is surrounded by some loops. But the film thickness of the spots is changed with the elements of the targets and the height of the substrate over the magnet. We tried to know the formation mechanic of this novel phenomenon from three angles. In the angle of quantum mechanics, we think about the wave character of the deposition particles. Secondly, we consider maybe our phenomenon is one of the macroscopic quantum effect. Finally, because of the non-uniformity of the magnetic field, the deposition particles will gain lateral magnetic field force during their movements; we calculate the lateral deviation directly. Disappointedly, these three means can’t explain our experimental phenomenon. Now we hold that there’s a large number of ions in the sputtering space besides electrons and the atoms of the targets. These ions will be bounded by Lorentz force and gradient magnetic field force and their interaction force during their motivation from the target to the substrate. That’s why the spots and loops generate. And in this way, we get some opinion on the deposition mechanics in this longitudinal magnetic field.

修改后译文

Magnetic field in the cathode of the traditional magnetron sputtering device was shielded, then a permanent magnet was laid below the substrate, namely, a longitudinal magnetic field was introduced in the sputtering space to carry out sputtering. Under this arrangement, the effect of the longitudinal magnetic field on the movements of the plasma can be investigated. The macroscopic appearances of the films deposited by this means exhibited regular geometric graphics, that is, a round spot in the center of each film, and regularly distributed loops surrounding the spot. But the film thickness of the spots changed with the elements of the targets and the height of the substrate over the magnet. We tried to explain the mechanism of this novel phenomenon from the perspective of quantum mechanics and macroscopic quantum effect and by directly considering lateral deviation of particle under the gradient magnetic field, which turned out to be unsuccessful. Finally, we hold that there were a large number of ions in the sputtering space, which would be bounded by Lorentz force and gradient magnetic field force and their interactive forces, thus resulting in the generation of the spots and loops. Accordingly, the sputtering mechanism in longitudinal magnetic field was discussed in this paper.

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